Jetzt anpassen und kaufen
56,10 €
exkl. USt.
Konfigurieren
Norm

ISO 16531:2013

Ausgabedatum: 2013 05 16

Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS

ISO 16531:2013 specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using ...
Weiterlesen
ZURÜCKGEZOGEN : 2020 10 06
Herausgeber:
International Organization for Standardization
Format:
Digital | 18 Seiten
Sprache:
Englisch
Aktuell Gültig:

ISO 16531:2013 specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy and X-ray photoelectron spectroscopy. These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size below ~1 mm in diameter. The methods do not include depth resolution optimization.

ISO 16531:2020
2020 10 05
Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated meas...
Norm
ISO 16531:2013
2013 05 16
Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated meas...
Norm
Norm
ISO 16531:2020
Ausgabedatum : 2020 10 05
Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS